Bachelor Thesis Open Access
Gruhn, Frederick
<?xml version='1.0' encoding='UTF-8'?>
<record xmlns="http://www.loc.gov/MARC21/slim">
<leader>00000nam##2200000uu#4500</leader>
<datafield tag="520" ind1=" " ind2=" ">
<subfield code="a"><p>In this thesis, the impact of X-ray irradiation on Si-Ge Hetero Junction Bipolar Transistor (HBT) technology is investigated. For this purpose, Q-Band amplifier chips using SG13G3Cu transistors technology, manufactured by the Leibniz Institute for High Performance Microelectronics (IHP), were used. To quantify the irradiation-induced damage, the following figures of merit were examined: the forward Gummel characteristics (I-V curve), the Early voltage/output resistance, and the power consumption of the chip. The chips were irradiated with X-ray doses ranging from 25 kGy to 200 kGy. The results demonstrate a robust tolerance to ionizing irradiation up to and beyond a Total Ionizing Dose (TID) of&nbsp;200 kGy.</p></subfield>
</datafield>
<datafield tag="542" ind1=" " ind2=" ">
<subfield code="l">open</subfield>
</datafield>
<datafield tag="856" ind1="4" ind2=" ">
<subfield code="s">14255895</subfield>
<subfield code="u">https://publish.etp.kit.edu/record/22393/files/Impact_of_X_Ray_irradiation_on_Silicon_Germanium_HBT_s_final_version.pdf</subfield>
<subfield code="z">md5:b5a91ea30a89530df4bd8847eac8e80b</subfield>
</datafield>
<datafield tag="980" ind1=" " ind2=" ">
<subfield code="a">thesis</subfield>
<subfield code="b">bachelor-thesis</subfield>
</datafield>
<controlfield tag="005">20260202133834.0</controlfield>
<datafield tag="041" ind1=" " ind2=" ">
<subfield code="a">eng</subfield>
</datafield>
<datafield tag="909" ind1="C" ind2="O">
<subfield code="o">oai:publish.etp.kit.edu:22393</subfield>
<subfield code="p">user-hardware</subfield>
<subfield code="p">user-etp</subfield>
</datafield>
<datafield tag="260" ind1=" " ind2=" ">
<subfield code="c">2025-11-26</subfield>
</datafield>
<datafield tag="245" ind1=" " ind2=" ">
<subfield code="a">Investigating the impact of X-Ray irradiation on Silicon-Germanium Hetero junction Bipolar Transistors (HBTs)</subfield>
</datafield>
<datafield tag="100" ind1=" " ind2=" ">
<subfield code="a">Gruhn, Frederick</subfield>
<subfield code="u">KIT/ETP</subfield>
</datafield>
<controlfield tag="001">22393</controlfield>
<datafield tag="700" ind1=" " ind2=" ">
<subfield code="a">Husemann, Ulrich</subfield>
<subfield code="u">KIT/ETP</subfield>
<subfield code="4">ths</subfield>
</datafield>
<datafield tag="700" ind1=" " ind2=" ">
<subfield code="a">Dierlamm, Alexander</subfield>
<subfield code="u">KIT/ETP</subfield>
<subfield code="4">ths</subfield>
</datafield>
<datafield tag="980" ind1=" " ind2=" ">
<subfield code="a">user-etp</subfield>
</datafield>
<datafield tag="980" ind1=" " ind2=" ">
<subfield code="a">user-hardware</subfield>
</datafield>
</record>